Epitaxial thin films and nanostructures

Invited Speakers:

  • Pavel Boldyrevskii, Nizhny Novgorod Lobachevsky State University, Russia
    Modeling and analysis of convective processes in gas phase during MOCVD epitaxy of semiconducting layers in reaction chamber with rotating     disk     substrate holder
  • Arnold Peter Farkas, University of Szeged, Hungary
    Adsorption properties of gold nanoparticles on h-BN nanomesh prepared on Rh(111) surface
  • Marti Gich, Institut de Ciència de Materials de Barcelona-CSIC Campus de la UAB, Spain
    Functional epitaxial films by physical and chemical deposition. Advantages and synergies
  • Lev Kantorovitch, King’s College London, UK
    Ethylene decomposition on Ir(111): Initial path to graphene formation
  • Wilhelm Kossack, Universität Leipzig, Germany
    Confinement and Interface induced orientation of semi-crystalline Poly-Caprolactone
  • Seigi Mizuno, Kyushu University, Japan
    Growth of Si4O5N3 single layer on SiC(0001) in vacuum
  • Yuji Matsumoto, Tohoku University, Japan
    Epitaxial growth of SiC films via Si-Ni flux by pulsed laser deposition
  • Balla Diop Ngom, University of South Africa, South Africa
    A-axis Growth of Nanostructured VO2 Thin films by Pulsed Laser Deposition on substrate glass
  • Shingo Ono, Nagoya Institute of Technology, Japan
    Filterless vacuum ultraviolet photodetector based on fluoride thin films
  • Herbert Pfnur, Institut für Festkörperphysik, ATMOS, Germany
    Crystalline Ba silicate films: a new robust high-k dielectric material
  • Ivan Prieto-Gonzalez, ETH Zürich, Switzerland
    GaAs on Si nano-heteroepitaxy by MOVPE
  • Stephen Pennycook, National University of Singapore, Singapore
    Innovating New Materials through Aberration-corrected Microscopy
  • Bernd Rauschenbach, IOM and University of Leipzig, Germany
    Sculptured thin films by ion beam sputtering
  • Eva Rauls, Universität Paderborn, Germany
    Structure formation of macromolecules on metal surfaces and ways to investigate them
  • Masato Sone, Tokyo Institute of Technology, Japan
    Crystal Growth on Nanoscale Wiring by Cu Electrodeposition in Supercritical Carbon Dioxide Emulsified Electrolyte toward 3D Integrated Circuits
  • Tetsuro Shirasawa, University of Tokyo, Japan
    Quick characterization of epitaxial thin films by rainbow x-ray diffraction
  • Vincent Sallet, CNRS-Université de Versailles- St Quentin, France
    1D ZnO-based heterostructures for optoelectronic applications : growth mechanisms and characterisations at the nanoscale
  • Hikmet Yukselici, Yildiz Technical University, Turkey
    Optical and structural properties of semiconductor nanocrystals in thin films and in glass
  • Oksana Yastrubchak, National Academy of Science of Ukraine, Ukraine
    New ferromagnetic semiconductor compounds for spintronic application
  • Shouke Yan, Beijing University of Chemical Technolog, China
    Epitaxial-induced polymer crystallization: mechanism and application in multistructure control




Workshop Chair:

Operating Organization



Important Dates

Abstract deadline: August 1, 2016 Registration for early birds: Before July 20, 2016